Photoresist compositions and components
This invention is directed to novel photoresist processes and compositions having high resolution novalac resins, high resolution photoactive components with several diazoquinone groups per molecule, and solvents having a high solvency power, better safety, improved photospeed, higher contrast and e...
Saved in:
Main Authors | , , , , , |
---|---|
Format | Patent |
Language | English French German |
Published |
11.03.1998
|
Edition | 6 |
Subjects | |
Online Access | Get full text |
Cover
Loading…
Summary: | This invention is directed to novel photoresist processes and compositions having high resolution novalac resins, high resolution photoactive components with several diazoquinone groups per molecule, and solvents having a high solvency power, better safety, improved photospeed, higher contrast and equivalent cast film thickness from lower percent solids formulations. |
---|---|
Bibliography: | Application Number: EP19960102977 |