Photosensitive polycondensation compound for negative lithographic plates

Process for preparing a photosensitive polycondensation compound in the presence of condensing medium which is a mixture containing from 30 to 5 parts by weight of 98% aqueous methanesulfonic acid and from 70 to 95 parts by weight of 85% aqueous phosphoric acid, respectively. Thus obtained polyconde...

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Bibliographic Details
Main Authors CANESTRI, GIUSEPPE, DE CANDIDO, STEFANO
Format Patent
LanguageEnglish
French
German
Published 12.10.1994
Edition5
Subjects
APPARATUS SPECIALLY ADAPTED THEREFOR
CHEMISTRY
CINEMATOGRAPHY
COMPOSITIONS BASED THEREON
ELECTROGRAPHY
HOLOGRAPHY
MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONSONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
MATERIALS THEREFOR
METALLURGY
ORGANIC MACROMOLECULAR COMPOUNDS
ORIGINALS THEREFOR
PHOTOGRAPHY
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES
PHYSICS
THEIR PREPARATION OR CHEMICAL WORKING-UP
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Summary:Process for preparing a photosensitive polycondensation compound in the presence of condensing medium which is a mixture containing from 30 to 5 parts by weight of 98% aqueous methanesulfonic acid and from 70 to 95 parts by weight of 85% aqueous phosphoric acid, respectively. Thus obtained polycondensation compound and printing plates containing it.
Bibliography:Application Number: EP19940200771