INSPECTION METHOD AND APPARATUS

An inspection method includes the steps of forming a first beam of first polarization and a second beam of second polarization different from the first polarization, illuminating a surface to be inspected, with the first beam, and detecting an interference beam resulting from interference between th...

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Bibliographic Details
Main Authors TAKEUCHI, SEIJI, YOSHII, MINORU, NOSE, NORIYUKI, TSUJI, TOSHIHIKO, MIYAZAKI, KYOICHI, MORI, TETSUZO
Format Patent
LanguageEnglish
French
German
Published 30.01.2002
Edition7
Subjects
APPARATUS SPECIALLY ADAPTED THEREFOR
CINEMATOGRAPHY
ELECTROGRAPHY
HOLOGRAPHY
INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIRCHEMICAL OR PHYSICAL PROPERTIES
MATERIALS THEREFOR
MEASURING
ORIGINALS THEREFOR
PHOTOGRAPHY
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES
PHYSICS
TESTING
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Summary:An inspection method includes the steps of forming a first beam of first polarization and a second beam of second polarization different from the first polarization, illuminating a surface to be inspected, with the first beam, and detecting an interference beam resulting from interference between the second beam and a particular beam being scattered from the surface illuminated with the first beam and advancing in a direction sideways to the direction of illumination with the first beam, the scattered beam having its polarization being changed from the first polarization.
Bibliography:Application Number: EP19930309113