Ceramic via composition, multilayer ceramic circuit containing same, and process for using same

A novel metal filled via composition for co-firing with glass-ceramic material. The composition comprises a conductive first metal (copper), an oxidizable second metal (selected from the group consisting of iron, nickel and cobalt) and an organic medium in which said first and second metal are dispe...

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Bibliographic Details
Main Authors DIVAKARUNI, RENUKA SHASTRI, NATARAJAN, GOVINDARAJAN, REDDY, SRINIVASA S.N, SAMMET, MANFRED, CASEY, JON ALFRED
Format Patent
LanguageEnglish
French
German
Published 01.12.1993
Edition5
Subjects
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Summary:A novel metal filled via composition for co-firing with glass-ceramic material. The composition comprises a conductive first metal (copper), an oxidizable second metal (selected from the group consisting of iron, nickel and cobalt) and an organic medium in which said first and second metal are dispersed. The via composition has a volume shrinkage approximating that of the ceramic material, and thus overcomes the problem of volume shrinkage mismatch between the via (particularly copper filled via) and ceramic upon sintering. The novel via composition exhibits enhanced adhesion to the ceramic. A sintering process by which shrinkage of the novel via composition is controlled and adhesion is improved is also disclosed.
Bibliography:Application Number: EP19930480042