Integrated circuits

Fabrication of submicron design rule large scale integrated circuits depends upon use of a strut-segmented mask with struts providing mechanical support to permit thinned mask segments consequently yielding improved resolution. "Stitching" - positioning of projected segment images to yield...

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Bibliographic Details
Main Authors LEVENTHAL, MARVIN, BERGER, STEVEN D, LIDDLE, JAMES A
Format Patent
LanguageEnglish
French
German
Published 21.05.2003
Edition7
Subjects
APPARATUS SPECIALLY ADAPTED THEREFOR
BASIC ELECTRIC ELEMENTS
CINEMATOGRAPHY
ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
ELECTROGRAPHY
HOLOGRAPHY
MATERIALS THEREFOR
ORIGINALS THEREFOR
PHOTOGRAPHY
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES
PHYSICS
SEMICONDUCTOR DEVICES
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Summary:Fabrication of submicron design rule large scale integrated circuits depends upon use of a strut-segmented mask with struts providing mechanical support to permit thinned mask segments consequently yielding improved resolution. "Stitching" - positioning of projected segment images to yield a satisfactory continuous image - is aided by lithographically defined skirts forming a continuous border within strut-supported segments.
Bibliography:Application Number: EP19920311251