Sample delivery system for delivering sample material to the plasma of an ICP-AES spectrometer
The invention relates to a method and an appliance for delivering sample material to the plasma of an ICP-AES spectrometer by means of a gas supply device. A sample container is inserted which opens into the central tube leading to the plasma. A gas stream is passed in between the mouth of the sampl...
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Main Authors | , |
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Format | Patent |
Language | English French German |
Published |
09.06.1999
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Edition | 6 |
Subjects | |
Online Access | Get full text |
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Summary: | The invention relates to a method and an appliance for delivering sample material to the plasma of an ICP-AES spectrometer by means of a gas supply device. A sample container is inserted which opens into the central tube leading to the plasma. A gas stream is passed in between the mouth of the sample container and the tube. The appliance is constructed in such a way that according to the method the gas stream rising in the central tube envelopes the central axis. As a result, the powdered or vaporous sample material is conveyed to the plasma along this central axis without loss or contamination. The amount of the sample material delivered can be regulated via the gas pressure. |
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Bibliography: | Application Number: EP19920117718 |