Embossing metal mold and manufacturing method thereof
According to the present invention, etching is used to form a concave and convex pattern corresponding to information (6) an embossing metal mold comprising a conductive layer (1) and a layer which includes an Ni electric-plating layer (2), or an Ni electric-plating layer (2), so that the surface of...
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Main Authors | , , , |
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Format | Patent |
Language | English French German |
Published |
03.06.1992
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Subjects | |
Online Access | Get full text |
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Summary: | According to the present invention, etching is used to form a concave and convex pattern corresponding to information (6) an embossing metal mold comprising a conductive layer (1) and a layer which includes an Ni electric-plating layer (2), or an Ni electric-plating layer (2), so that the surface of the embossing metal mold will not be contaminated even if processing conditions are somewhat changed, and that the mold will have less defects. Thus, optical disk substrates of high quality can be produced. Besides, time required for manufacturing a stamper can be shortened. |
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Bibliography: | Application Number: EP19910120182 |