Method of forming electrode pattern
A method of forming an electrode pattern in a conductive film covering a surface of a substrate, comprising making a metal electrode for etching contact the conductive film at an area on an exposed surface of the conductive film; and moving the area where the metal electrode for etching contacts the...
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Main Authors | , |
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Format | Patent |
Language | English French German |
Published |
08.06.1994
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Edition | 5 |
Subjects | |
Online Access | Get full text |
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Summary: | A method of forming an electrode pattern in a conductive film covering a surface of a substrate, comprising making a metal electrode for etching contact the conductive film at an area on an exposed surface of the conductive film; and moving the area where the metal electrode for etching contacts the conductive film while a voltage is applied between the metal electrode for etching and the conductive film to remove the conductive film at and in the vicinity of the area where the metal electrode for etching contacts the conductive film and form an electrode pattern in the conductive film; reduces the number of steps in forming an electrode pattern, and the method does not require complicated and expensive apparatuses and enables easy production of fine electrode patterns of large areas. |
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Bibliography: | Application Number: EP19910307816 |