Positive-type photosensitive electrodeposition coating composition and process for producing circuit plate

A positive-type photosensitive electrodeposition coating composition comprising (A) a photosensitive compound having a molecular weight of less than 6,000 and containing at least one modified quinonediazidesulfone units represented by the following formula (I) wherein R1 represents R2 represents a h...

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Bibliographic Details
Main Authors HIGASHI, JUNICHI, IWASAWA, NAOZUMI
Format Patent
LanguageEnglish
French
German
Published 23.02.1994
Edition5
Subjects
ADHESIVES
APPARATUS SPECIALLY ADAPTED THEREFOR
CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS
CHEMICAL PAINT OR INK REMOVERS
CHEMISTRY
CINEMATOGRAPHY
COATING COMPOSITIONS, e.g. PAINTS, VARNISHES ORLACQUERS
CORRECTING FLUIDS
DYES
ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
ELECTROGRAPHY
FILLING PASTES
HOLOGRAPHY
INKS
MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
MATERIALS THEREFOR
METALLURGY
MISCELLANEOUS APPLICATIONS OF MATERIALS
MISCELLANEOUS COMPOSITIONS
NATURAL RESINS
ORIGINALS THEREFOR
PAINTS
PASTES OR SOLIDS FOR COLOURING OR PRINTING
PHOTOGRAPHY
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES
PHYSICS
POLISHES
PRINTED CIRCUITS
USE OF MATERIALS THEREFOR
WOODSTAINS
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Summary:A positive-type photosensitive electrodeposition coating composition comprising (A) a photosensitive compound having a molecular weight of less than 6,000 and containing at least one modified quinonediazidesulfone units represented by the following formula (I) wherein R1 represents R2 represents a hydrogen atom, an alkyl group, a cycloalkyl group or an alkyl ether group, and R3 represents an alkylene group, a cycloalkylene group or an alkylene ether group, in the molecule and (B) an acrylic resin having a salt-forming group. o
Bibliography:Application Number: EP19900102687