A production method of superconductive thin film and a device thereof

The superconductive thin film is made in the procedures that; in a vacuum vessel having an internal pressure maintained at least lower than 10<-> torr, each metal of the component elements of the superconductive thin film to be made is charged into a crucible so as to be heated as a simple sub...

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Bibliographic Details
Main Author HIGUCHI, FUMINORI
Format Patent
LanguageEnglish
French
German
Published 16.06.1999
Edition6
Subjects
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Summary:The superconductive thin film is made in the procedures that; in a vacuum vessel having an internal pressure maintained at least lower than 10<-> torr, each metal of the component elements of the superconductive thin film to be made is charged into a crucible so as to be heated as a simple substance respectively so that the evaporated metallic element is spouted from the crucible as a cluster beam, the spouted evaporation metallic element is ionized and accelerated through an electric field, impinging to a substrate while spouting oxygen gas toward the substrate, controlling the heating of the crucible so that the amount of the respective metallic evaporation beams is made to be a predetermined mole ratio, whereby the superconductive thin film is formed on the substrate.
Bibliography:Application Number: EP19880105180