HIGH SENSITIVITY RESISTS HAVING AUTODECOMPOSITION TEMPERATURES GREATER THAN ABOUT 160 C BACKGROUND OF THE INVENTION

• Main Authors: IWAMOTO, NANCY ELLEN, CROCKATT, DALE MURRAY, CONLEY, WILLARD EARL, BRUNSVOLD, WILLIAM ROSS
• Format: Patent
• Language: English
• Published: 11.07.1990
• Edition: 4
• Subjects: APPARATUS SPECIALLY ADAPTED THEREFOR; BASIC ELECTRIC ELEMENTS; CINEMATOGRAPHY; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR; ELECTRICITY; ELECTROGRAPHY; HOLOGRAPHY; MATERIALS THEREFOR; ORIGINALS THEREFOR; PHOTOGRAPHY; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES; PHYSICS; SEMICONDUCTOR DEVICES