PROCESS FOR PREPARING NEGATIVE RELIEF IMAGES

• Main Authors: ITO, HIROSHI, HULT, ANDERS, MACDONALD, SCOTT ARTHUR, WILLSON, CARLTON GRANT
• Format: Patent
• Language: English
• Published: 13.07.1988
• Edition: 4
• Subjects: APPARATUS SPECIALLY ADAPTED THEREFOR; BASIC ELECTRIC ELEMENTS; CINEMATOGRAPHY; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR; ELECTRICITY; ELECTROGRAPHY; HOLOGRAPHY; MATERIALS THEREFOR; ORIGINALS THEREFOR; PHOTOGRAPHY; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES; PHYSICS; SEMICONDUCTOR DEVICES

Negative relief images are generated by a process comprising the use of cationic polymerization and plasma etching. The process comprises a process for generating a negative tone resist image comprising the steps of:(1) coating a substrate with a film that contains a cationic photoinitiator;(2) exposing the film in an imagewise fashion to radiation and thereby generating cationic initiator in the exposed regions of the film;(3) treating the exposed film with a cationic-sensitive monomer to form a film of polymer resistant to plasma etching; and(4) developing the resist image by etching with a plasma.