PROCESS FOR PREPARING NEGATIVE RELIEF IMAGES

Negative relief images are generated by a process comprising the use of cationic polymerization and plasma etching. The process comprises a process for generating a negative tone resist image comprising the steps of:(1) coating a substrate with a film that contains a cationic photoinitiator;(2) expo...

Full description

Saved in:
Bibliographic Details
Main Authors ITO, HIROSHI, HULT, ANDERS, MACDONALD, SCOTT ARTHUR, WILLSON, CARLTON GRANT
Format Patent
LanguageEnglish
Published 13.07.1988
Edition4
Subjects
APPARATUS SPECIALLY ADAPTED THEREFOR
BASIC ELECTRIC ELEMENTS
CINEMATOGRAPHY
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
ELECTROGRAPHY
HOLOGRAPHY
MATERIALS THEREFOR
ORIGINALS THEREFOR
PHOTOGRAPHY
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES
PHYSICS
SEMICONDUCTOR DEVICES
Online AccessGet full text

Cover

More Information
Summary:Negative relief images are generated by a process comprising the use of cationic polymerization and plasma etching. The process comprises a process for generating a negative tone resist image comprising the steps of:(1) coating a substrate with a film that contains a cationic photoinitiator;(2) exposing the film in an imagewise fashion to radiation and thereby generating cationic initiator in the exposed regions of the film;(3) treating the exposed film with a cationic-sensitive monomer to form a film of polymer resistant to plasma etching; and(4) developing the resist image by etching with a plasma.
Bibliography:Application Number: EP19860100926