PROCESS FOR STRIPPING PHOTORESIST AND STRIPPING RESTS FROM SEMICONDUCTOR SURFACES

Photoresist and stripper residues can be rapidly and completely removed from semiconductor substrates after the stripping process with an aqueous post-rinsing agent which contains a nonionogenic surfactant and an organic base.

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Bibliographic Details
Main Authors LITTERS, ALOIS, NEISIUS, KARL-HEINZ
Format Patent
LanguageEnglish
German
Published 05.06.1991
Subjects
APPARATUS SPECIALLY ADAPTED THEREFOR
AUXILIARY PROCESSES IN PHOTOGRAPHY
CINEMATOGRAPHY
ELECTROGRAPHY
HOLOGRAPHY
MATERIALS THEREFOR
MIXING, e.g. DISSOLVING, EMULSIFYING, DISPERSING
ORIGINALS THEREFOR
PERFORMING OPERATIONS
PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR,STEREO-PHOTOGRAPHIC PROCESSES
PHOTOGRAPHY
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES
PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES
PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
PHYSICS
TRANSPORTING
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Summary:Photoresist and stripper residues can be rapidly and completely removed from semiconductor substrates after the stripping process with an aqueous post-rinsing agent which contains a nonionogenic surfactant and an organic base.
Bibliography:Application Number: EP19860100104