PLASMA ETCH PROCESS FOR SINGLE-CRYSTAL SILICON WITH IMPROVED SELECTIVITY TO SILICON DIOXIDE

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Bibliographic Details
Main Authors BAYMAN, ATIYE, THOMAS, MAMMEN
Format Patent
LanguageEnglish
French
German
Published 03.03.1987
Edition4
Subjects
BASIC ELECTRIC ELEMENTS
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
SEMICONDUCTOR DEVICES
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Bibliography:Application Number: EP19840903912