A PROCESS FOR PRODUCING A NEGATIVE TONE RESIST IMAGE

A negative tone resist image is produced by the successive steps of exposing a film to a pattern of radiation, the film having such a composition that after exposure to the radiation it contains a polymer which reacts with an organometallic reagent; treating the exposed film with the organometallic...

Full description

Saved in:
Bibliographic Details
Main Authors ITO, HIROSHI, MILLER, ROBERT DENNIS, MACDONALD, SCOTT ARTHUR, WILLSON, CARLTON GRANT
Format Patent
LanguageEnglish
Published 28.10.1987
Edition4
Subjects
APPARATUS SPECIALLY ADAPTED THEREFOR
BASIC ELECTRIC ELEMENTS
CINEMATOGRAPHY
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
ELECTROGRAPHY
HOLOGRAPHY
MATERIALS THEREFOR
ORIGINALS THEREFOR
PHOTOGRAPHY
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES
PHYSICS
SEMICONDUCTOR DEVICES
Online AccessGet full text

Cover

More Information
Summary:A negative tone resist image is produced by the successive steps of exposing a film to a pattern of radiation, the film having such a composition that after exposure to the radiation it contains a polymer which reacts with an organometallic reagent; treating the exposed film with the organometallic reagent; and developing a relief image by further treating the exposed film with an oxygen plasma.
Bibliography:Application Number: EP19850104228