Method and apparatus for X-ray exposure

• Main Authors: KEMBO, YUKIO, KUNI, ASAHIRO
• Format: Patent
• Language: English; French; German
• Published: 10.04.1985
• Edition: 4
• Subjects: APPARATUS SPECIALLY ADAPTED THEREFOR; BASIC ELECTRIC ELEMENTS; CINEMATOGRAPHY; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR; ELECTRICITY; ELECTROGRAPHY; HOLOGRAPHY; MATERIALS THEREFOR; ORIGINALS THEREFOR; PHOTOGRAPHY; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES; PHYSICS; SEMICONDUCTOR DEVICES

The present invention relates to a method and an apparatus of a step-and-repeat type X-ray exposure system, in which the contrast characteristic is improved. In order to prevent a multiple exposure due to the transmitted X-rays through gold patterns in successive adjacent shots, a stop (11) is provided on an X-ray mask (3 min ) separately from a pattern, thereby intercepting the incident X-rays to the portion other than an exposure portion (Ex) on a substrate (5) surface. In addition, in order to fully display the above effect, there is provided means for fixing and moving an X-ray source, the mask and the substrate, respectively.