Method and apparatus for X-ray exposure

The present invention relates to a method and an apparatus of a step-and-repeat type X-ray exposure system, in which the contrast characteristic is improved. In order to prevent a multiple exposure due to the transmitted X-rays through gold patterns in successive adjacent shots, a stop (11) is provi...

Full description

Saved in:
Bibliographic Details
Main Authors KEMBO, YUKIO, KUNI, ASAHIRO
Format Patent
LanguageEnglish
French
German
Published 10.04.1985
Edition4
Subjects
APPARATUS SPECIALLY ADAPTED THEREFOR
BASIC ELECTRIC ELEMENTS
CINEMATOGRAPHY
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
ELECTROGRAPHY
HOLOGRAPHY
MATERIALS THEREFOR
ORIGINALS THEREFOR
PHOTOGRAPHY
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES
PHYSICS
SEMICONDUCTOR DEVICES
Online AccessGet full text

Cover

More Information
Summary:The present invention relates to a method and an apparatus of a step-and-repeat type X-ray exposure system, in which the contrast characteristic is improved. In order to prevent a multiple exposure due to the transmitted X-rays through gold patterns in successive adjacent shots, a stop (11) is provided on an X-ray mask (3 min ) separately from a pattern, thereby intercepting the incident X-rays to the portion other than an exposure portion (Ex) on a substrate (5) surface. In addition, in order to fully display the above effect, there is provided means for fixing and moving an X-ray source, the mask and the substrate, respectively.
Bibliography:Application Number: EP19840111626