AMORPHOUS SILICIUM SOLAR CELL AND METHOD OF MANUFACTURING THE SAME

Solar cells having a semiconductor body composed of amorphous silicon which is deposited on a substrate coated with aluminum at least on one of its surfaces, with a diffusion barrier layer composed of titanium nitride positioned between the aluminum layer and the semiconductor body. The aluminum lay...

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Bibliographic Details
Main Authors MOLLER, MATTHIAS, KAUSCHE, HELMOLD
Format Patent
LanguageEnglish
German
Published 01.03.1989
Edition4
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Summary:Solar cells having a semiconductor body composed of amorphous silicon which is deposited on a substrate coated with aluminum at least on one of its surfaces, with a diffusion barrier layer composed of titanium nitride positioned between the aluminum layer and the semiconductor body. The aluminum layer and the titanium nitride layer can be produced by high frequency sputtering while the semiconductor body can be produced by a glow discharge deposition.
Bibliography:Application Number: EP19830111370