BISARIDO COMPOUNDS, LIGHT-SENSITIVE COMPOSITIONS CONTAINING THEM AND PROCESS FOR OBTAINING RELIEF IMAGES

Noble bisazido compounds of the formula I where X and Y may be identical or different and may be O, S, SO2, N-R1 or a bond, m and n may be identical or different and may be integers from 1 to 8, with the proviso that the sum of m + n does not exceed 12, Z denotes a bond or, if X and Y both denote a...

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Main Authors NEISIUS, KARL HEINZ, HAAS, GUNTHER
Format Patent
LanguageEnglish
German
Published 29.01.1986
Edition4
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Abstract Noble bisazido compounds of the formula I where X and Y may be identical or different and may be O, S, SO2, N-R1 or a bond, m and n may be identical or different and may be integers from 1 to 8, with the proviso that the sum of m + n does not exceed 12, Z denotes a bond or, if X and Y both denote a bond or m and n are both not equal to 1, also O, S, SO2 or N-R1, or if X and Y both denote a bond, also CO, 1,3-cyclopentylene optionally substituted in position 2 by an oxo group or 1,3-cyclohexylene optionally substituted in position 2 by an oxo group and/or in position 5 by an alkyl containing 1 to 6 carbon atoms, R and R' may be identical or different and denote H, halogen or alkyl containing 1 to 6 carbon atoms, and R1 denotes H or alkyl containing 1 to 6 carbon atoms, with the proviso that -X-CmH2m-Z-CnH2n-Y- does not denote -(CH2)2- or -(CH2)3-, have a high sensitivity for far UV light and are consequently suitable as photosensitive components in negative-working compositions sensitive to far UV light. The relief structures photolithographically produced with the photosensitive compositions according to the invention are notable for outstanding mechanical properties and have a high resolution. They are suitable for the photolithographic production of miniaturised circuits.
AbstractList Noble bisazido compounds of the formula I where X and Y may be identical or different and may be O, S, SO2, N-R1 or a bond, m and n may be identical or different and may be integers from 1 to 8, with the proviso that the sum of m + n does not exceed 12, Z denotes a bond or, if X and Y both denote a bond or m and n are both not equal to 1, also O, S, SO2 or N-R1, or if X and Y both denote a bond, also CO, 1,3-cyclopentylene optionally substituted in position 2 by an oxo group or 1,3-cyclohexylene optionally substituted in position 2 by an oxo group and/or in position 5 by an alkyl containing 1 to 6 carbon atoms, R and R' may be identical or different and denote H, halogen or alkyl containing 1 to 6 carbon atoms, and R1 denotes H or alkyl containing 1 to 6 carbon atoms, with the proviso that -X-CmH2m-Z-CnH2n-Y- does not denote -(CH2)2- or -(CH2)3-, have a high sensitivity for far UV light and are consequently suitable as photosensitive components in negative-working compositions sensitive to far UV light. The relief structures photolithographically produced with the photosensitive compositions according to the invention are notable for outstanding mechanical properties and have a high resolution. They are suitable for the photolithographic production of miniaturised circuits.
Author NEISIUS, KARL HEINZ
HAAS, GUNTHER
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Snippet Noble bisazido compounds of the formula I where X and Y may be identical or different and may be O, S, SO2, N-R1 or a bond, m and n may be identical or...
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SubjectTerms ACYCLIC OR CARBOCYCLIC COMPOUNDS
APPARATUS SPECIALLY ADAPTED THEREFOR
CHEMISTRY
CINEMATOGRAPHY
ELECTROGRAPHY
HOLOGRAPHY
MATERIALS THEREFOR
METALLURGY
ORGANIC CHEMISTRY
ORIGINALS THEREFOR
PHOTOGRAPHY
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES
PHYSICS
Title BISARIDO COMPOUNDS, LIGHT-SENSITIVE COMPOSITIONS CONTAINING THEM AND PROCESS FOR OBTAINING RELIEF IMAGES
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