BISARIDO COMPOUNDS, LIGHT-SENSITIVE COMPOSITIONS CONTAINING THEM AND PROCESS FOR OBTAINING RELIEF IMAGES

• Main Authors: NEISIUS, KARL HEINZ, HAAS, GUNTHER
• Format: Patent
• Language: English; German
• Published: 29.01.1986
• Edition: 4
• Subjects: ACYCLIC OR CARBOCYCLIC COMPOUNDS; APPARATUS SPECIALLY ADAPTED THEREFOR; CHEMISTRY; CINEMATOGRAPHY; ELECTROGRAPHY; HOLOGRAPHY; MATERIALS THEREFOR; METALLURGY; ORGANIC CHEMISTRY; ORIGINALS THEREFOR; PHOTOGRAPHY; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES; PHYSICS

Noble bisazido compounds of the formula I where X and Y may be identical or different and may be O, S, SO2, N-R1 or a bond, m and n may be identical or different and may be integers from 1 to 8, with the proviso that the sum of m + n does not exceed 12, Z denotes a bond or, if X and Y both denote a bond or m and n are both not equal to 1, also O, S, SO2 or N-R1, or if X and Y both denote a bond, also CO, 1,3-cyclopentylene optionally substituted in position 2 by an oxo group or 1,3-cyclohexylene optionally substituted in position 2 by an oxo group and/or in position 5 by an alkyl containing 1 to 6 carbon atoms, R and R' may be identical or different and denote H, halogen or alkyl containing 1 to 6 carbon atoms, and R1 denotes H or alkyl containing 1 to 6 carbon atoms, with the proviso that -X-CmH2m-Z-CnH2n-Y- does not denote -(CH2)2- or -(CH2)3-, have a high sensitivity for far UV light and are consequently suitable as photosensitive components in negative-working compositions sensitive to far UV light. The relief structures photolithographically produced with the photosensitive compositions according to the invention are notable for outstanding mechanical properties and have a high resolution. They are suitable for the photolithographic production of miniaturised circuits.