BISARIDO COMPOUNDS, LIGHT-SENSITIVE COMPOSITIONS CONTAINING THEM AND PROCESS FOR OBTAINING RELIEF IMAGES
Noble bisazido compounds of the formula I where X and Y may be identical or different and may be O, S, SO2, N-R1 or a bond, m and n may be identical or different and may be integers from 1 to 8, with the proviso that the sum of m + n does not exceed 12, Z denotes a bond or, if X and Y both denote a...
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Main Authors | , |
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Format | Patent |
Language | English German |
Published |
29.01.1986
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Edition | 4 |
Subjects | |
Online Access | Get full text |
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Summary: | Noble bisazido compounds of the formula I where X and Y may be identical or different and may be O, S, SO2, N-R1 or a bond, m and n may be identical or different and may be integers from 1 to 8, with the proviso that the sum of m + n does not exceed 12, Z denotes a bond or, if X and Y both denote a bond or m and n are both not equal to 1, also O, S, SO2 or N-R1, or if X and Y both denote a bond, also CO, 1,3-cyclopentylene optionally substituted in position 2 by an oxo group or 1,3-cyclohexylene optionally substituted in position 2 by an oxo group and/or in position 5 by an alkyl containing 1 to 6 carbon atoms, R and R' may be identical or different and denote H, halogen or alkyl containing 1 to 6 carbon atoms, and R1 denotes H or alkyl containing 1 to 6 carbon atoms, with the proviso that -X-CmH2m-Z-CnH2n-Y- does not denote -(CH2)2- or -(CH2)3-, have a high sensitivity for far UV light and are consequently suitable as photosensitive components in negative-working compositions sensitive to far UV light. The relief structures photolithographically produced with the photosensitive compositions according to the invention are notable for outstanding mechanical properties and have a high resolution. They are suitable for the photolithographic production of miniaturised circuits. |
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Bibliography: | Application Number: EP19830108727 |