NEW CEPHEM COMPOUNDS AND PROCESSES FOR PREPARATION THEREOF

New cephem compounds of the formula: wherein R is amino or a protected amino group; R is hydrogen, lower aliphatic hydrocarbon group which may be substituted with suitable substituent(s), cyclo(lower)alkyl, or cyclo(lower)alkenyl; R is lower alkyl which mad be substituted with suitable substituents(...

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Bibliographic Details
Main Authors SAKANE, KAZUO, TERAJI, TSUTOMU, GOTO, JIRO
Format Patent
LanguageEnglish
Published 07.12.1983
Subjects
CHEMISTRY
HETEROCYCLIC COMPOUNDS
METALLURGY
ORGANIC CHEMISTRY
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Summary:New cephem compounds of the formula: wherein R is amino or a protected amino group; R is hydrogen, lower aliphatic hydrocarbon group which may be substituted with suitable substituent(s), cyclo(lower)alkyl, or cyclo(lower)alkenyl; R is lower alkyl which mad be substituted with suitable substituents(s); R is hydrogen, lower alkyl or amino; and R is hydrogen or lower alkyl; and pharmaceutically acceptable salts thereof, and processes for their preparation and a pharmaceutical antibacterial composition comprising them in association with a pharmaceutical antibacterial composition comprising a compound of claim 1 in association with a pharmaceutically acceptable, substantially non-toxic carrier or excipient.
Bibliography:Application Number: EP19820105316