System for transferring a fine pattern onto a target

• Main Authors: SHINOZAKI, TOSHIAKI, TAKASU, SHINICHIRO
• Format: Patent
• Language: English; French; German
• Published: 30.06.1982
• Subjects: APPARATUS SPECIALLY ADAPTED THEREFOR; BASIC ELECTRIC ELEMENTS; CINEMATOGRAPHY; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR; ELECTRICITY; ELECTROGRAPHY; HOLOGRAPHY; INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIRCHEMICAL OR PHYSICAL PROPERTIES; MATERIALS THEREFOR; MEASURING; ORIGINALS THEREFOR; PHOTOGRAPHY; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES; PHYSICS; SEMICONDUCTOR DEVICES; TESTING

An X-ray system for transferring a fine pattern onto a target has a mask (12), on the surface (6) of which is formed an X-ray absorbing layer (17) in a predetermined pattern and which is made of a single crystal (2) of high regularity. Parallel mon- ochromic X-rays (4) become incident on the lattice plane (h, k, I) of the single crystal (2) at an angle O. Diffraction X-rays (8) emerging from the lattice plane (h, k, I) are projected onto the surface of a wafer (16) in the normal direction. An X-ray resist layer (18) is formed on the surface of the wafer (16). Since incident X-rays (4) and diffraction X-rays (8) are absorbed by the X-ray absorbing layer (17) on the mask (12), the pattern defined by the layer (17) is projected on the X-ray resist layer (18).