Method and apparatus for thermal phase separation

An improved thermal phase separation unit separates contaminants from a contaminated substrate. The improved thermal phase separation unit includes an enclosure arranged to withstand temperatures created by a combustion system, an essentially air-tight processing chamber supported within the enclosu...

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Bibliographic Details
Main Author KAPILA MUKESH
Format Patent
LanguageEnglish
Published 24.12.2007
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Summary:An improved thermal phase separation unit separates contaminants from a contaminated substrate. The improved thermal phase separation unit includes an enclosure arranged to withstand temperatures created by a combustion system, an essentially air-tight processing chamber supported within the enclosure by support columns connected between the processing chamber and a bottom of the enclosure, a heat shield disposed between the processing chamber and the bottom of the enclosure, and a vapor handling system arranged to remove vapor from the processing chamber. The combustion system heats the processing chamber, and, in turn, indirectly heats contaminated substrate being processed in the processing chamber so as to volatize contaminants in the contaminated substrate to vapor that is subsequently removed by the vapor handling system.
Bibliography:Application Number: EG2005NA00631