Sel mutuel d'amlopidine et d'atorvastatine, procédé pour sa préparation et compositions pharmaceutiques les contenant

• Main Authors: HAMANAKA ERNEST SEIICHI, CHANG GEORGE
• Format: Patent
• Language: French
• Published: 27.03.2004
• Edition: 7
• Subjects: CHEMICAL SURFACE TREATMENT; CHEMISTRY; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; COATING MATERIAL WITH METALLIC MATERIAL; COATING METALLIC MATERIAL; DIFFUSION TREATMENT OF METALLIC MATERIAL; HETEROCYCLIC COMPOUNDS; HUMAN NECESSITIES; HYGIENE; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL; MEDICAL OR VETERINARY SCIENCE; METALLURGY; ORGANIC CHEMISTRY; PREPARATIONS FOR MEDICAL, DENTAL, OR TOILET PURPOSES; SPECIFIC THERAPEUTIC ACTIVITY OF CHEMICAL COMPOUNDS ORMEDICINAL PREPARATIONS; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION

A method for depositing films of a fluorinated compound is disclosed, wherein a reactive sputtering process allows the use of a metal or other non-fluorinated material as the target material. The process developed also utilizes XeF2 as a vapor source, which provides fluorine for the formation of the fluorinated compound. Unlike reactive process gases, such as SF4 and CF4, used in previous experiments attempting reactive sputtering of fluoride compounds, the XeF2 vapor does not result in unwanted contamination due to a reactive gas cation, i.e., inclusions of carbon or sulfur. These, and other considerations, have allowed the development of a process for fabricating dense, optical quality fluoride films. At the same time, the material costs and handling expenses related to the XeF2 source are also relatively low. The method described is ideally suited for the deposition of metal fluoride compounds for use in anti-reflection coatings, UV optical coatings, as well as various applications in the semiconductor, optoelectronics, and other industries.