Abscheidung von Titannitridfilme
I have found that in order to improve sheet resistance uniformity of metal nitride films, such as titanium nitride, the chamber must be operated at low pressure. The nitrogen gas flow rates required to deposit metal nitride is determined, and the pumping speed in the chamber is increased to produce...
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Main Author | |
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Format | Patent |
Language | German |
Published |
08.08.2002
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Edition | 7 |
Subjects | |
Online Access | Get full text |
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Summary: | I have found that in order to improve sheet resistance uniformity of metal nitride films, such as titanium nitride, the chamber must be operated at low pressure. The nitrogen gas flow rates required to deposit metal nitride is determined, and the pumping speed in the chamber is increased to produce uniform films at low pressure. |
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Bibliography: | Application Number: DE19986002726T |