Überwachung des Films der Verschmutzung in einem Prozessstrom

Method and apparatus for determining accumulated film thickness at the inside diameter of a main stream conduit (10) conducting a main stream of a flowing fluid by employing: a transparent shunt conduit (12) to shunt from the main stream a sample stream of the process fluid, a reference light emitte...

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Bibliographic Details
Main Authors WETEGROVE, ROBERT L., WINFIELD, ILLINOIS 60190, US, BANKS RODNEY H., BANKS RODNEY H., NAPERVILLE, ILLINOIS 60563, US
Format Patent
LanguageGerman
Published 11.07.1996
Edition6
Subjects
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Summary:Method and apparatus for determining accumulated film thickness at the inside diameter of a main stream conduit (10) conducting a main stream of a flowing fluid by employing: a transparent shunt conduit (12) to shunt from the main stream a sample stream of the process fluid, a reference light emitter (20) and light detector (22) at a reference section of the shunt where any appreciable film is removed, an upstream sample light emitter (16) and detector (18) opposed thereto, a common source (34) of light so the respective emitters emit light beams of the same intensity, and means for determining concurrently analogs of light received by the detectors, whereby film thickness may be determined for the sample.
Bibliography:Application Number: DE19926007122T