Verfahren zur Herstellung eines mehrfachen, ionenselektiven Membransensors

• Main Authors: BATTILOTTI, MASSIMO, I-00128 TOR DE' CENCI ROME, IT, GIONGO, MATTEO, I-00060 CAPENA ROME, IT, MAZZAMURRO, GIUSEPPINA, I-00155 ROME, IT
• Format: Patent
• Language: German
• Published: 28.10.1993
• Edition: 5
• Subjects: APPARATUS SPECIALLY ADAPTED THEREFOR; CINEMATOGRAPHY; ELECTROGRAPHY; HOLOGRAPHY; INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIRCHEMICAL OR PHYSICAL PROPERTIES; MATERIALS THEREFOR; MEASURING; ORIGINALS THEREFOR; PHOTOGRAPHY; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES; PHYSICS; TESTING

A process for obtaining a multifunctional, ino-selective-membrane sensor is disclosed, which process comprises the following steps: a) preparation of a siloxanic prepolymer, followed by one or more deposition(s) of said siloxanic prepolymer on a device of MOS or ISFET type; b) preparation of a solution containing an ionophore, a monomer of a polymerisable olefin, 2,4-toluene-diisocyanate and a dialcohol or a diamine or a glycol or a trialcohol or a triamine, which preparation is followed, after that said solution has been kept stirred for at least 48 hours at room temperature, by the deposition thereof on the siloxanic prepolymer, which deposition is carried out by means of a spinner; c) photochemical treatment in the presence of a photo-initiator by means of UV light, with a suitable mask being used, which allows the exposure to UV light to take place on one gate only; d) chemical washing of the sensor, by means of an organic solvent; e) thermal treatment ("thermal curing"), so as to complete the reactions of polymerization; f) preparation and deposition onto the siloxanic polymer of another solution, or of a plurality of other solutions, by operating in a similar way as of the above (b) step, which solution(s) contain(s) an ionophore different from the preceding one(s), which deposition is followed by the (c), (d) and (e) steps, with a mask being used, which is different from the preceding mask(s), which makes it possible the exposure to UV light to be carried out on a gate different from the preceding one(s).