Lithographischer Apparat, Verfahren zur Herstellung einer Vorrichtung und damit erzeugte Vorrichtung

The apparatus has a substrate holder (1) with two sets of micro-burls (3,5), where distal ends of the micro-burls define respective contact surfaces. The micro-burls (5) are arranged such that a substrate (8) contacts the contact surfaces, when the substrate is clamped against the holder. The micro-...

Full description

Saved in:
Bibliographic Details
Main Authors VAN MEER, ASCHWIN LODEWIJK HENDRICUS JOHANNES, VAN EMPEL, TJARKO ADRIAAN RUDOLF, ZAAL, KOEN JACOBUS JOHANNES MARIA, AANTJES, TON
Format Patent
LanguageGerman
Published 29.01.2009
Subjects
APPARATUS SPECIALLY ADAPTED THEREFOR
BASIC ELECTRIC ELEMENTS
CINEMATOGRAPHY
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
ELECTROGRAPHY
HOLOGRAPHY
MATERIALS THEREFOR
ORIGINALS THEREFOR
PHOTOGRAPHY
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES
PHYSICS
SEMICONDUCTOR DEVICES
Online AccessGet full text

Cover

More Information
Summary:The apparatus has a substrate holder (1) with two sets of micro-burls (3,5), where distal ends of the micro-burls define respective contact surfaces. The micro-burls (5) are arranged such that a substrate (8) contacts the contact surfaces, when the substrate is clamped against the holder. The micro-burls (5) are arranged such that a wafer is distanced from one of the contact surfaces, when the substrate is not clamped.
Bibliography:Application Number: DE20046011705T