Resistzusammensetzung und Musterübertragungsverfahren

• Main Authors: KINSHO, TAKESHI, HATAKEYAMA, JUN, NISHI, TSUNEHIRO, WATANABE, TAKERU, HASEGAWA, KOJI, KOBAYASHI, TOMOHIRO
• Format: Patent
• Language: German
• Published: 17.01.2008
• Subjects: APPARATUS SPECIALLY ADAPTED THEREFOR; BASIC ELECTRIC ELEMENTS; CHEMISTRY; CINEMATOGRAPHY; COMPOSITIONS BASED THEREON; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR; ELECTRICITY; ELECTROGRAPHY; HOLOGRAPHY; MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVINGCARBON-TO-CARBON UNSATURATED BONDS; MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONSONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS; MATERIALS THEREFOR; METALLURGY; ORGANIC MACROMOLECULAR COMPOUNDS; ORIGINALS THEREFOR; PHOTOGRAPHY; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES; PHYSICS; SEMICONDUCTOR DEVICES; THEIR PREPARATION OR CHEMICAL WORKING-UP

A resist composition contains as a base resin a polymer represented by the following formula and having a Mw of 1,000-500,000. R is H, methyl or CO2R , R is alkyl, R is H, methyl or CH2CO2R , at least one of R to R is a carboxyl or hydroxyl-containing monovalent hydrocarbon group, and the reminders are independently H or alkyl, at least one of R to R is a monovalent hydrocarbon group of 2 to 15 carbon atoms containing a -CO2- partial structure, and the reminders are independently H or alkyl, R is a polycyclic hydrocarbon group or an alkyl group containing such a polycyclic hydrocarbon group, R is an acid labile group, Z is a divalent group of atoms to construct a 5- or 6-membered ring which contains a carboxylate, carbonate or acid anhydride therein, k is 0 or 1, x is a number from more than 0 to 1, "a" to "d" are from 0 to less than 1, x+a+b+c+d = 1. The resist composition has significantly improved resolution, substrate adhesiveness, and etching resistance and is very useful in precise microfabrication.