DURCH STRAHLUNG POLYMERISIERBARES GEMISCH UND VERFAHREN ZUR HERSTELLUNG EINER LOETSTOPMASKE

• Main Authors: DECKER, RUDOLF, 6501 BODENHEIM, DE, HERWIG, WALTER. DR., 6232 BAD SODEN, DE, ERBES, KURT, 6093 FLOERSHEIM, DE, EMMELIUS, MICHAEL. DR., 6500 MAINZ, DE
• Format: Patent
• Language: German
• Published: 04.04.1991
• Subjects: APPARATUS SPECIALLY ADAPTED THEREFOR; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; CHEMISTRY; CINEMATOGRAPHY; COMPOSITIONS BASED THEREON; ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR; ELECTRICITY; ELECTROGRAPHY; HOLOGRAPHY; MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVINGCARBON-TO-CARBON UNSATURATED BONDS; MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONSONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS; MATERIALS THEREFOR; METALLURGY; ORGANIC MACROMOLECULAR COMPOUNDS; ORIGINALS THEREFOR; PHOTOGRAPHY; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES; PHYSICS; PRINTED CIRCUITS; THEIR PREPARATION OR CHEMICAL WORKING-UP; USE OF INORGANIC OR NON-MACROMOLECULAR ORGANIC SUBSTANCES ASCOMPOUNDING INGREDIENTS

A description is given of a radiation-polymerisable composition which contains a polymerisable compound, a polymeric binder containing units of methacrylic acid, a methacrylate and a styrene, the latter in a proportion of 40 to 65% by weight, a finely divided mineral pigment with a silicic acid or silicate base, a photopolymerisation initiator, a compound containing at least two epoxy groups in the molecule and a thermal hardener for epoxy groups. The composition is suitable in particular for producing solder resist masks and, after exposure to an image and development, can be cured by heating to 80 to 150 DEG C to form a template which is resistant under soldering conditions.