Sulfonsäureester für die Sensibilisierung von Positivlacken

• Main Authors: WALSH, JOSEPH GREGORY, OAKLAND, CA 94605, US, MCKEAN, DENNIS RICHARD, SAN JOSE, CA 95129, US, WILLSON, CARLTON GRANT, SAN JOSE, CA 95126, US, MILLER, ROBERT DENNIS, SAN JOSE, CA 95120, US
• Format: Patent
• Language: German
• Published: 28.10.1993
• Edition: 5
• Subjects: ACYCLIC OR CARBOCYCLIC COMPOUNDS; APPARATUS SPECIALLY ADAPTED THEREFOR; AUXILIARY PROCESSES IN PHOTOGRAPHY; CHEMISTRY; CINEMATOGRAPHY; ELECTROGRAPHY; HOLOGRAPHY; MATERIALS THEREFOR; METALLURGY; ORGANIC CHEMISTRY; ORIGINALS THEREFOR; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR,STEREO-PHOTOGRAPHIC PROCESSES; PHOTOGRAPHY; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES; PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES; PHYSICS