Process and device for the vapour deposition of thin layers

• Main Authors: YASUNAGA, SEIJI, KAWAGOE, YASUYUKI, YAMANISHI, KENICHIRO, NANBA, KEISUKE, TANAKA, MASAAKI, YAGI, SHIGENORI, AMAGASAKI, HYOGO, JP, INOUE, SHINICHI, IMADA, KATSUHIRO
• Format: Patent
• Language: English; German
• Published: 08.06.1989
• Subjects: CHEMICAL SURFACE TREATMENT; CHEMISTRY; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; COATING MATERIAL WITH METALLIC MATERIAL; COATING METALLIC MATERIAL; DIFFUSION TREATMENT OF METALLIC MATERIAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL; METALLURGY; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION

In a process for the vapour deposition of thin layers, vapours of a vapourisable material are directed from an associated vapouriser located in a vacuum vessel onto a substrate and, at the same time, a jet of an reactive or oxidising gas in the form of excited neutral atoms or ions is directed onto the substrate. A device for forming thin layers comprises a vacuum vessel, a vapouriser arranged in the vacuum vessel for vapourising vapourisable material, an ozone generator and a device for introducing ozone produced by the generator to a substrate located in the vacuum vessel.