Process for producing a dry-film photoresist

A dry-film photoresist is disclosed, which is suitable for use in the fabrication of printed circuit boards and comprises a photopolymerisable layer which is laminated between a covering film and a carrier film and which adheres more strongly to the covering film than to the carrier film, and in whi...

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Main Authors SCHAAKE, SCOTT GLEN, HOCKESSIN, DEL., US, FIFIELD, CHARLES CALHOUN, WILMINGTON, DEL., US, ROACH, DONALD JOSEPH, SWEDESBORO, N.J., US
Format Patent
LanguageEnglish
German
Published 09.02.1989
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Abstract A dry-film photoresist is disclosed, which is suitable for use in the fabrication of printed circuit boards and comprises a photopolymerisable layer which is laminated between a covering film and a carrier film and which adheres more strongly to the covering film than to the carrier film, and in which the carrier film is located on the inside of the roll; also disclosed is an improved process for producing the dry-film photoresist.
AbstractList A dry-film photoresist is disclosed, which is suitable for use in the fabrication of printed circuit boards and comprises a photopolymerisable layer which is laminated between a covering film and a carrier film and which adheres more strongly to the covering film than to the carrier film, and in which the carrier film is located on the inside of the roll; also disclosed is an improved process for producing the dry-film photoresist.
Author FIFIELD, CHARLES CALHOUN, WILMINGTON, DEL., US
SCHAAKE, SCOTT GLEN, HOCKESSIN, DEL., US
ROACH, DONALD JOSEPH, SWEDESBORO, N.J., US
Author_xml – fullname: SCHAAKE, SCOTT GLEN, HOCKESSIN, DEL., US
– fullname: FIFIELD, CHARLES CALHOUN, WILMINGTON, DEL., US
– fullname: ROACH, DONALD JOSEPH, SWEDESBORO, N.J., US
BookMark eNrjYmDJy89L5WTQCSjKT04tLlZIyy9SKCjKTylNzsxLV0hUSCmq1E3LzMlVKMjIL8kvSi3OLC7hYWBNS8wpTuWF0twMCm6uIc4euqkF-fGpxQWJyal5qSXxLq7GFkam5hZGjobGRCgBADrPK0E
ContentType Patent
DBID EVB
DatabaseName esp@cenet
DatabaseTitleList
Database_xml – sequence: 1
  dbid: EVB
  name: esp@cenet
  url: http://worldwide.espacenet.com/singleLineSearch?locale=en_EP
  sourceTypes: Open Access Repository
DeliveryMethod fulltext_linktorsrc
Discipline Medicine
Chemistry
Sciences
Physics
DocumentTitleAlternate VERFAHREN ZUR HERSTELLUNG EINES TROCKENFILM-PHOTORESISTS
ExternalDocumentID DE3825782A1
GroupedDBID EVB
ID FETCH-epo_espacenet_DE3825782A13
IEDL.DBID EVB
IngestDate Fri Jul 19 12:27:24 EDT 2024
IsOpenAccess true
IsPeerReviewed false
IsScholarly false
Language English
German
LinkModel DirectLink
MergedId FETCHMERGED-epo_espacenet_DE3825782A13
Notes Application Number: DE19883825782
OpenAccessLink https://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=19890209&DB=EPODOC&CC=DE&NR=3825782A1
ParticipantIDs epo_espacenet_DE3825782A1
PublicationCentury 1900
PublicationDate 19890209
PublicationDateYYYYMMDD 1989-02-09
PublicationDate_xml – month: 02
  year: 1989
  text: 19890209
  day: 09
PublicationDecade 1980
PublicationYear 1989
RelatedCompanies HERCULES INC., WILMINGTON, DEL., US
RelatedCompanies_xml – name: HERCULES INC., WILMINGTON, DEL., US
Score 2.3946495
Snippet A dry-film photoresist is disclosed, which is suitable for use in the fabrication of printed circuit boards and comprises a photopolymerisable layer which is...
SourceID epo
SourceType Open Access Repository
SubjectTerms APPARATUS SPECIALLY ADAPTED THEREFOR
CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS
CINEMATOGRAPHY
ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
ELECTROGRAPHY
HOLOGRAPHY
MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
MATERIALS THEREFOR
ORIGINALS THEREFOR
PHOTOGRAPHY
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES
PHYSICS
PRINTED CIRCUITS
Title Process for producing a dry-film photoresist
URI https://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=19890209&DB=EPODOC&locale=&CC=DE&NR=3825782A1
hasFullText 1
inHoldings 1
isFullTextHit
isPrint
link http://utb.summon.serialssolutions.com/2.0.0/link/0/eLvHCXMwfV1LS8QwEB6W9XnTqri-yEF6Mri0SWsPRdw-WIR9IKvsbekrbEHbsq2I_95J7K5e9JBLAsMkZDKT5JtvAK65LGPMDEZlcW7KWBLRSJg25aYwLWH1jTSRycmjsTV8Zo9zPu9Avs6FUTyhH4ocES0qQXtv1Hld_Txi-QpbWd_GOXaV9-HM9fU0auE_GP04uj9wg-nEn3i657l-oI-fXPNO7k3jAS9KWzKKljT7wctAJqVUvz1KeADbUxRWNIfQyQoN9rx14TUNdkftf7cGOwqgmdTY2RphfQQ3LbifYLxJKsXYiv6HRCRdfVKRv76RalniVTqrUeAxkDCYeUOKCiw2k134wUZV8wS6RVlkp0Asnsbc4QJbxCS7sEhj9OVM2LbdF1z0oPenmLN_xs5h_xs0ZdC-cwHdZvWeXaKXbeIrtT5fOmmADw
link.rule.ids 230,309,786,891,25594,76903
linkProvider European Patent Office
linkToHtml http://utb.summon.serialssolutions.com/2.0.0/link/0/eLvHCXMwfV1LT8MwDLam8Rg3GKCNZw6oJyKqNmnZoUKsDw3YugkVtNvUV8Qk6Kq1CPHvcUM3uMAhF0eynCiO7eSzDXDBqzbGTGO0as5NGYtDGgrdpFwXuiEMVUviKjl55BuDJ3Y_5dMGzFe5MLJO6IcsjogaFaO-l_K-zn8esRyJrSyuojmSFjdeYDlKEtbwH_R-eorTt9zJ2Bnbim1bjqv4j5Z-XZ1N7RYDpQ0TI0IZKT33q6SU_LdF8XZhc4LMsnIPGmnWhpa9arzWhu1R_d_dhi0J0IwLJNZKWOzDZQ3uJ-hvklxWbEX7Q0KSLD-pmL--kfxlgaF0WiDDAyCeG9gDigLM1oudOe5aVP0QmtkiSztADJ5EvMcFjpBV1YVFEqEtZ8I0TVVw0YXun2yO_pk7h9YgGA1nwzv_4Rh2vgFUGlV7J9Asl-_pKVrcMjqTe_UFW0uC-Q
openUrl ctx_ver=Z39.88-2004&ctx_enc=info%3Aofi%2Fenc%3AUTF-8&rfr_id=info%3Asid%2Fsummon.serialssolutions.com&rft_val_fmt=info%3Aofi%2Ffmt%3Akev%3Amtx%3Apatent&rft.title=Process+for+producing+a+dry-film+photoresist&rft.inventor=SCHAAKE%2C+SCOTT+GLEN%2C+HOCKESSIN%2C+DEL.%2C+US&rft.inventor=FIFIELD%2C+CHARLES+CALHOUN%2C+WILMINGTON%2C+DEL.%2C+US&rft.inventor=ROACH%2C+DONALD+JOSEPH%2C+SWEDESBORO%2C+N.J.%2C+US&rft.date=1989-02-09&rft.externalDBID=A1&rft.externalDocID=DE3825782A1