Process for producing a dry-film photoresist
A dry-film photoresist is disclosed, which is suitable for use in the fabrication of printed circuit boards and comprises a photopolymerisable layer which is laminated between a covering film and a carrier film and which adheres more strongly to the covering film than to the carrier film, and in whi...
Saved in:
Main Authors | , , |
---|---|
Format | Patent |
Language | English German |
Published |
09.02.1989
|
Subjects | |
Online Access | Get full text |
Cover
Loading…
Abstract | A dry-film photoresist is disclosed, which is suitable for use in the fabrication of printed circuit boards and comprises a photopolymerisable layer which is laminated between a covering film and a carrier film and which adheres more strongly to the covering film than to the carrier film, and in which the carrier film is located on the inside of the roll; also disclosed is an improved process for producing the dry-film photoresist. |
---|---|
AbstractList | A dry-film photoresist is disclosed, which is suitable for use in the fabrication of printed circuit boards and comprises a photopolymerisable layer which is laminated between a covering film and a carrier film and which adheres more strongly to the covering film than to the carrier film, and in which the carrier film is located on the inside of the roll; also disclosed is an improved process for producing the dry-film photoresist. |
Author | FIFIELD, CHARLES CALHOUN, WILMINGTON, DEL., US SCHAAKE, SCOTT GLEN, HOCKESSIN, DEL., US ROACH, DONALD JOSEPH, SWEDESBORO, N.J., US |
Author_xml | – fullname: SCHAAKE, SCOTT GLEN, HOCKESSIN, DEL., US – fullname: FIFIELD, CHARLES CALHOUN, WILMINGTON, DEL., US – fullname: ROACH, DONALD JOSEPH, SWEDESBORO, N.J., US |
BookMark | eNrjYmDJy89L5WTQCSjKT04tLlZIyy9SKCjKTylNzsxLV0hUSCmq1E3LzMlVKMjIL8kvSi3OLC7hYWBNS8wpTuWF0twMCm6uIc4euqkF-fGpxQWJyal5qSXxLq7GFkam5hZGjobGRCgBADrPK0E |
ContentType | Patent |
DBID | EVB |
DatabaseName | esp@cenet |
DatabaseTitleList | |
Database_xml | – sequence: 1 dbid: EVB name: esp@cenet url: http://worldwide.espacenet.com/singleLineSearch?locale=en_EP sourceTypes: Open Access Repository |
DeliveryMethod | fulltext_linktorsrc |
Discipline | Medicine Chemistry Sciences Physics |
DocumentTitleAlternate | VERFAHREN ZUR HERSTELLUNG EINES TROCKENFILM-PHOTORESISTS |
ExternalDocumentID | DE3825782A1 |
GroupedDBID | EVB |
ID | FETCH-epo_espacenet_DE3825782A13 |
IEDL.DBID | EVB |
IngestDate | Fri Jul 19 12:27:24 EDT 2024 |
IsOpenAccess | true |
IsPeerReviewed | false |
IsScholarly | false |
Language | English German |
LinkModel | DirectLink |
MergedId | FETCHMERGED-epo_espacenet_DE3825782A13 |
Notes | Application Number: DE19883825782 |
OpenAccessLink | https://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=19890209&DB=EPODOC&CC=DE&NR=3825782A1 |
ParticipantIDs | epo_espacenet_DE3825782A1 |
PublicationCentury | 1900 |
PublicationDate | 19890209 |
PublicationDateYYYYMMDD | 1989-02-09 |
PublicationDate_xml | – month: 02 year: 1989 text: 19890209 day: 09 |
PublicationDecade | 1980 |
PublicationYear | 1989 |
RelatedCompanies | HERCULES INC., WILMINGTON, DEL., US |
RelatedCompanies_xml | – name: HERCULES INC., WILMINGTON, DEL., US |
Score | 2.3946495 |
Snippet | A dry-film photoresist is disclosed, which is suitable for use in the fabrication of printed circuit boards and comprises a photopolymerisable layer which is... |
SourceID | epo |
SourceType | Open Access Repository |
SubjectTerms | APPARATUS SPECIALLY ADAPTED THEREFOR CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS CINEMATOGRAPHY ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROGRAPHY HOLOGRAPHY MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS PRINTED CIRCUITS |
Title | Process for producing a dry-film photoresist |
URI | https://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=19890209&DB=EPODOC&locale=&CC=DE&NR=3825782A1 |
hasFullText | 1 |
inHoldings | 1 |
isFullTextHit | |
isPrint | |
link | http://utb.summon.serialssolutions.com/2.0.0/link/0/eLvHCXMwfV1LS8QwEB6W9XnTqri-yEF6Mri0SWsPRdw-WIR9IKvsbekrbEHbsq2I_95J7K5e9JBLAsMkZDKT5JtvAK65LGPMDEZlcW7KWBLRSJg25aYwLWH1jTSRycmjsTV8Zo9zPu9Avs6FUTyhH4ocES0qQXtv1Hld_Txi-QpbWd_GOXaV9-HM9fU0auE_GP04uj9wg-nEn3i657l-oI-fXPNO7k3jAS9KWzKKljT7wctAJqVUvz1KeADbUxRWNIfQyQoN9rx14TUNdkftf7cGOwqgmdTY2RphfQQ3LbifYLxJKsXYiv6HRCRdfVKRv76RalniVTqrUeAxkDCYeUOKCiw2k134wUZV8wS6RVlkp0Asnsbc4QJbxCS7sEhj9OVM2LbdF1z0oPenmLN_xs5h_xs0ZdC-cwHdZvWeXaKXbeIrtT5fOmmADw |
link.rule.ids | 230,309,786,891,25594,76903 |
linkProvider | European Patent Office |
linkToHtml | http://utb.summon.serialssolutions.com/2.0.0/link/0/eLvHCXMwfV1LT8MwDLam8Rg3GKCNZw6oJyKqNmnZoUKsDw3YugkVtNvUV8Qk6Kq1CPHvcUM3uMAhF0eynCiO7eSzDXDBqzbGTGO0as5NGYtDGgrdpFwXuiEMVUviKjl55BuDJ3Y_5dMGzFe5MLJO6IcsjogaFaO-l_K-zn8esRyJrSyuojmSFjdeYDlKEtbwH_R-eorTt9zJ2Bnbim1bjqv4j5Z-XZ1N7RYDpQ0TI0IZKT33q6SU_LdF8XZhc4LMsnIPGmnWhpa9arzWhu1R_d_dhi0J0IwLJNZKWOzDZQ3uJ-hvklxWbEX7Q0KSLD-pmL--kfxlgaF0WiDDAyCeG9gDigLM1oudOe5aVP0QmtkiSztADJ5EvMcFjpBV1YVFEqEtZ8I0TVVw0YXun2yO_pk7h9YgGA1nwzv_4Rh2vgFUGlV7J9Asl-_pKVrcMjqTe_UFW0uC-Q |
openUrl | ctx_ver=Z39.88-2004&ctx_enc=info%3Aofi%2Fenc%3AUTF-8&rfr_id=info%3Asid%2Fsummon.serialssolutions.com&rft_val_fmt=info%3Aofi%2Ffmt%3Akev%3Amtx%3Apatent&rft.title=Process+for+producing+a+dry-film+photoresist&rft.inventor=SCHAAKE%2C+SCOTT+GLEN%2C+HOCKESSIN%2C+DEL.%2C+US&rft.inventor=FIFIELD%2C+CHARLES+CALHOUN%2C+WILMINGTON%2C+DEL.%2C+US&rft.inventor=ROACH%2C+DONALD+JOSEPH%2C+SWEDESBORO%2C+N.J.%2C+US&rft.date=1989-02-09&rft.externalDBID=A1&rft.externalDocID=DE3825782A1 |