NEUE HETEROCYCLISCHE VERBINDUNGEN, IHRE HERSTELLUNG UND VERWENDUNG
Compounds of the formula wherein (a) R1 is hydrogen, lower alkyl, lower alkoxy or 8-halo; R2 is hydrogen, lower alkyl, lower alkoxy or a fused benzene ring; and R3 and R4, together with each other, are -N=N-NH-; or (b) R1 and R2, together with each other, are -N=N-NH-; R3 is hydrogen, lower alkyl, l...
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Main Authors | , , , |
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Format | Patent |
Language | German |
Published |
12.07.1984
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Subjects | |
Online Access | Get full text |
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Summary: | Compounds of the formula wherein (a) R1 is hydrogen, lower alkyl, lower alkoxy or 8-halo; R2 is hydrogen, lower alkyl, lower alkoxy or a fused benzene ring; and R3 and R4, together with each other, are -N=N-NH-; or (b) R1 and R2, together with each other, are -N=N-NH-; R3 is hydrogen, lower alkyl, lower alkoxy, 2-halo, 3-halo or 4-halo; and R4 is hydrogen, lower alkyl, lower alkoxy or a fused benzene ring; and non-toxic, pharmacologically acceptable salts thereof formed with an inorganic or organic base. The compounds as well as their salts are useful as antiallergics. |
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Bibliography: | Application Number: DE19833300477 |