NEUE HETEROCYCLISCHE VERBINDUNGEN, IHRE HERSTELLUNG UND VERWENDUNG

Compounds of the formula wherein (a) R1 is hydrogen, lower alkyl, lower alkoxy or 8-halo; R2 is hydrogen, lower alkyl, lower alkoxy or a fused benzene ring; and R3 and R4, together with each other, are -N=N-NH-; or (b) R1 and R2, together with each other, are -N=N-NH-; R3 is hydrogen, lower alkyl, l...

Full description

Saved in:
Bibliographic Details
Main Authors RENTH,ERNST-OTTO,.DR, FUEGNER,ARMIN,DR, MENTRUP,ANTON,.DR, SCHROMM,KURT,.DR
Format Patent
LanguageGerman
Published 12.07.1984
Subjects
Online AccessGet full text

Cover

Loading…
More Information
Summary:Compounds of the formula wherein (a) R1 is hydrogen, lower alkyl, lower alkoxy or 8-halo; R2 is hydrogen, lower alkyl, lower alkoxy or a fused benzene ring; and R3 and R4, together with each other, are -N=N-NH-; or (b) R1 and R2, together with each other, are -N=N-NH-; R3 is hydrogen, lower alkyl, lower alkoxy, 2-halo, 3-halo or 4-halo; and R4 is hydrogen, lower alkyl, lower alkoxy or a fused benzene ring; and non-toxic, pharmacologically acceptable salts thereof formed with an inorganic or organic base. The compounds as well as their salts are useful as antiallergics.
Bibliography:Application Number: DE19833300477