Photomask is washed with anodic or cathodic water after cleaned with a hot sulfuric acid and hydrogen peroxide mixture for effective removal of residual sulfuric acid from the cleaned surface

• Main Authors: NAGAMURA, YOSHIKAZU, TOKIO/TOKYO, JP, YAMANAKA, KOJI, TODA, SAITAMA, JP, USUI, HOZUMI, SAITAMA, JP, YOSHIOKA, NOBUYUKI, TOKIO/TOKYO, JP
• Format: Patent
• Language: English; German
• Published: 17.06.1999
• Edition: 6
• Subjects: APPARATUS SPECIALLY ADAPTED THEREFOR; BASIC ELECTRIC ELEMENTS; CINEMATOGRAPHY; CLEANING; CLEANING IN GENERAL; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR; ELECTRICITY; ELECTROGRAPHY; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; HOLOGRAPHY; MATERIALS THEREFOR; ORIGINALS THEREFOR; PERFORMING OPERATIONS; PHOTOGRAPHY; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES; PHYSICS; PREVENTION OF FOULING IN GENERAL; SEMICONDUCTOR DEVICES; TECHNICAL SUBJECTS COVERED BY FORMER USPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ARTCOLLECTIONS [XRACs] AND DIGESTS; TRANSPORTING

A photomask is cleaned with a hot sulfuric acid and hydrogen peroxide mixture, washed with anodic or cathodic water produced by an electrolytic water generating unit and then freed from adhering foreign bodies. A photomask is cleaned by (a) surface cleaning with a hot mixture of sulfuric acid and hydrogen peroxide to decompose organic matter and remove metallic impurities; (b) removing residual sulfuric acid with anodic or cathodic water; (c) removing adhering foreign bodies; and (d) drying. An Independent claim is also included for equipment for carrying out the above process, including a cleaning liquid supply and control system for controlling the supplied liquids within a predetermined concentration or temperature range.