Magnetron

• Main Authors: GEHM, KLAUS., 01277 DRESDEN, DE, STRUEMPFEL, JOHANNES. ER.NAT., 01277 DRESDEN, DE, SCHULZE, DIETMAR. ER.NAT., 01474 SCHOENFELD-WEISIG, DE, ERBKAMM, WOLFGANG, 01257 DRESDEN, DE, HECHT, HANSRISTIAN., 01689 WEINBOEHLA, DE, DIMER, MARTIN., 01277 DRESDEN, DE
• Format: Patent
• Language: German
• Published: 28.01.1999
• Edition: 6
• Subjects: BASIC ELECTRIC ELEMENTS; CHEMICAL SURFACE TREATMENT; CHEMISTRY; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; COATING MATERIAL WITH METALLIC MATERIAL; COATING METALLIC MATERIAL; DIFFUSION TREATMENT OF METALLIC MATERIAL; ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS; ELECTRICITY; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL; METALLURGY; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION

The invention concerns a target cathode assembly with a target which produces an erosion trench during operation. Under the target support elements, are a cooling system and a magnetic system comprised of a return locking plate which is located on the side of the target cathode assembly opposite the target. The function of the invention is to avoid arc discharge on the target cathode assembly or between a neighboring assembly and target cathode assemblies. This is achieved by fitting the target cathode assembly with a soft magnetic material. Said material partially covers the exterior surface of the target cathode assembly during the exposure of the active target surface and is electrically connected to the target cathode assembly.