VERFAHREN ZUR HERSTELLUNG VON ZUMINDEST EINEM OPTOELEKTRONISCHEN BAUELEMENT UND OPTOELEKTRONISCHES BAUELEMENT
The invention relates to a method for producing at least one optoelectronic component (100) comprising the following steps: A) providing an auxiliary carrier (1), B) epitaxially applying a sacrificial layer (2) on the auxiliary carrier (1), the sacrificial layer (2) containing germanium, C) epitaxia...
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Main Authors | , |
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Format | Patent |
Language | German |
Published |
18.06.2020
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Subjects | |
Online Access | Get full text |
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Summary: | The invention relates to a method for producing at least one optoelectronic component (100) comprising the following steps: A) providing an auxiliary carrier (1), B) epitaxially applying a sacrificial layer (2) on the auxiliary carrier (1), the sacrificial layer (2) containing germanium, C) epitaxially applying a semiconductor layer sequence (3) on the sacrificial layer (2), D) removing the sacrificial layer (2) by means of dry etching (9), such that the auxiliary carrier (1) is removed from the semiconductor layer sequence (3). |
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Bibliography: | Application Number: DE20181104970T |