Hartmaske mit hoher Selektivität für IR-Sperrschichten zur Herstellung eines ferroelektrischen Kondensators

The present invention provides a ferroelectric device relatively free of fences by using a hardmask having high etching selectivity relative to an underlying barrier layer. The present invention also includes a method for suppressing the fences clinging to the sidewalls of ferroelectric devices. Add...

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Bibliographic Details
Main Authors KUMURA, YOSHINORI, TOMIOKA, KAZUHIRO, EGGER, ULRICH, KANAYA, HIROYUKI, ZHUANG, HAOREN
Format Patent
LanguageGerman
Published 29.12.2005
Edition7
Subjects
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