Hartmaske mit hoher Selektivität für IR-Sperrschichten zur Herstellung eines ferroelektrischen Kondensators
The present invention provides a ferroelectric device relatively free of fences by using a hardmask having high etching selectivity relative to an underlying barrier layer. The present invention also includes a method for suppressing the fences clinging to the sidewalls of ferroelectric devices. Add...
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| Main Authors | , , , , |
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| Format | Patent |
| Language | German |
| Published |
29.12.2005
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| Edition | 7 |
| Subjects | |
| Online Access | Get full text |
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| Abstract | The present invention provides a ferroelectric device relatively free of fences by using a hardmask having high etching selectivity relative to an underlying barrier layer. The present invention also includes a method for suppressing the fences clinging to the sidewalls of ferroelectric devices. Additionally, the present invention provides a ferroelectric device having a hardmask relatively thin compared to an underlying barrier layer when compared to prior art devices. |
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| AbstractList | The present invention provides a ferroelectric device relatively free of fences by using a hardmask having high etching selectivity relative to an underlying barrier layer. The present invention also includes a method for suppressing the fences clinging to the sidewalls of ferroelectric devices. Additionally, the present invention provides a ferroelectric device having a hardmask relatively thin compared to an underlying barrier layer when compared to prior art devices. |
| Author | ZHUANG, HAOREN TOMIOKA, KAZUHIRO KUMURA, YOSHINORI KANAYA, HIROYUKI EGGER, ULRICH |
| Author_xml | – fullname: KUMURA, YOSHINORI – fullname: TOMIOKA, KAZUHIRO – fullname: EGGER, ULRICH – fullname: KANAYA, HIROYUKI – fullname: ZHUANG, HAOREN |
| BookMark | eNqNyzsOgkAURmEKLXzt4VZ2JgNqYa0YjJ3Qkwn-yASYIXeuFq7HZdixMYlxAVan-c40GFlnMQnaRLO02teg1ghVrgJTiga1mIeR_iVU9m-m02WVdmD2RWWKSmDpeWdKwF7QNHd7IxgLT-Vg3HdnM9jBnZ29wnotjv08GJe68Vj8OguWxzjbJyt0LofvdAELyQ9xGEZKbZRS4S7Ksu36b_gB4G5Iiw |
| ContentType | Patent |
| DBID | EVB |
| DatabaseName | esp@cenet |
| DatabaseTitleList | |
| Database_xml | – sequence: 1 dbid: EVB name: esp@cenet url: http://worldwide.espacenet.com/singleLineSearch?locale=en_EP sourceTypes: Open Access Repository |
| DeliveryMethod | fulltext_linktorsrc |
| Discipline | Medicine Chemistry Sciences |
| Edition | 7 |
| ExternalDocumentID | DE112004000192TT5 |
| GroupedDBID | EVB |
| ID | FETCH-epo_espacenet_DE112004000192TT53 |
| IEDL.DBID | EVB |
| IngestDate | Fri Aug 02 08:59:32 EDT 2024 |
| IsOpenAccess | true |
| IsPeerReviewed | false |
| IsScholarly | false |
| Language | German |
| LinkModel | DirectLink |
| MergedId | FETCHMERGED-epo_espacenet_DE112004000192TT53 |
| Notes | Application Number: DE20041100192T |
| OpenAccessLink | https://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20051229&DB=EPODOC&CC=DE&NR=112004000192T5 |
| ParticipantIDs | epo_espacenet_DE112004000192TT5 |
| PublicationCentury | 2000 |
| PublicationDate | 20051229 |
| PublicationDateYYYYMMDD | 2005-12-29 |
| PublicationDate_xml | – month: 12 year: 2005 text: 20051229 day: 29 |
| PublicationDecade | 2000 |
| PublicationYear | 2005 |
| RelatedCompanies | KABUSHIKI KAISHA TOSHIBA, TOKIO/TOKYO INFINEON TECHNOLOGIES AG |
| RelatedCompanies_xml | – name: KABUSHIKI KAISHA TOSHIBA, TOKIO/TOKYO – name: INFINEON TECHNOLOGIES AG |
| Score | 2.6313424 |
| Snippet | The present invention provides a ferroelectric device relatively free of fences by using a hardmask having high etching selectivity relative to an underlying... |
| SourceID | epo |
| SourceType | Open Access Repository |
| SubjectTerms | BASIC ELECTRIC ELEMENTS CONVERSION OR DISTRIBUTION OF ELECTRIC POWER ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY EMERGENCY PROTECTIVE CIRCUIT ARRANGEMENTS GENERATION SEMICONDUCTOR DEVICES |
| Title | Hartmaske mit hoher Selektivität für IR-Sperrschichten zur Herstellung eines ferroelektrischen Kondensators |
| URI | https://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20051229&DB=EPODOC&locale=&CC=DE&NR=112004000192T5 |
| hasFullText | 1 |
| inHoldings | 1 |
| isFullTextHit | |
| isPrint | |
| link | http://utb.summon.serialssolutions.com/2.0.0/link/0/eLvHCXMwhV1bT8IwFD5BNOqbogbvfTB7W4TuAntYTNhGpoZLYBreCGUlEGAj24iJv8ef4Rt_zNMKXp54a5qu60777Xzf1p4DcEcrlJerjKkM5ZWqa0xXBybT1JLOuBFS06KhEIqNpum_6E89o5eDaHMWRsYJfZPBERFRQ8R7Jt_Xi9-PWK7cW5neswlWxQ_1wHaVjTpG94UC2q3ZXrvlthzFcWzXU5odG2mFXK-C0QTGDuwKKi1i7XuvNXEyZfHXrdSPYK-NPUbZMeRCXoADZ5N9rQD7jfVPbyyu8ZeewNzHmZ4P0ikn80lGxjFanHTRc0xlEojVR0ZGq8-EPHbU7oInSSoynYzxFuR9mRBfUD0-myG-CRfb3ckI28TycsQ6Tl9EnmOREjcVUjw9BaXuBY6v4rj7P4bqu96_xwwM7QzyURzxIhBmlM0hytHRkGp6hWsWK1la1aC6FlYELTyH2y2dXWxtcQmH35FNqUqtK8hnyZJfo8_O2I009Bc125xD |
| link.rule.ids | 230,309,786,891,25594,76906 |
| linkProvider | European Patent Office |
| linkToHtml | http://utb.summon.serialssolutions.com/2.0.0/link/0/eLvHCXMwhV3LTsJAFL1BNOJOUePbWZjuGqFPumhMaEuKPAPVsCMMDIEALWlLTPweP8MdP-adEXys2E0m0-n0zpzec9qZewEeFFNhxRKlMkV5JWsq1eSBQVW5oFGmjxTDUkZcKDaahv-iPff0XgbC7VkYESf0TQRHREQNEe-peF8vfz9iuWJvZfJIp1gVPVUC25W26hjdFwpot2x77ZbbciTHsV1PanZspBVivXJGE-h7sG_yCL2cPr2W-cmU5V-3UjmGgzb2GKYnkBmxPOScbfa1PBw2Nj-9sbjBX3IKCx9nejFIZowspimZRGhx0kXPMRNJINYfKRmvP2NS7cjdJYvjhGc6meAtyPsqJj6nemw-R3wTxre7kzG2icTliHWcvpDUIp4SN-FSPDkDqeIFji_juPs_huq73r_HDHT1HLJhFLILIFQvGkOUo-OhomomUy1asNSSrmjqyOS08BLud3R2tbPFPeT8oFHv16vN2jUcfUc5VWTFuoFsGq_YLfrvlN4Jo38BrnyfMA |
| openUrl | ctx_ver=Z39.88-2004&ctx_enc=info%3Aofi%2Fenc%3AUTF-8&rfr_id=info%3Asid%2Fsummon.serialssolutions.com&rft_val_fmt=info%3Aofi%2Ffmt%3Akev%3Amtx%3Apatent&rft.title=Hartmaske+mit+hoher+Selektivit%C3%A4t+f%C3%BCr+IR-Sperrschichten+zur+Herstellung+eines+ferroelektrischen+Kondensators&rft.inventor=KUMURA%2C+YOSHINORI&rft.inventor=TOMIOKA%2C+KAZUHIRO&rft.inventor=EGGER%2C+ULRICH&rft.inventor=KANAYA%2C+HIROYUKI&rft.inventor=ZHUANG%2C+HAOREN&rft.date=2005-12-29&rft.externalDBID=T5&rft.externalDocID=DE112004000192TT5 |