Photosensitive polymer for use in resist preparations for semiconductor lithography, contains repeat units with a pentafluoro-1,3,3-trihydroxybutyl group or a 3,3-difluoro-4-hydroxy-4-trifluoromethyloxetan-1-yl group

• Main Authors: CHOI, SANG-JUN, YOON, KWANG-SUB, WOO, SANG-GYUN, SONG, KI-YONG
• Format: Patent
• Language: English; German
• Published: 10.07.2003
• Edition: 7
• Subjects: APPARATUS SPECIALLY ADAPTED THEREFOR; BASIC ELECTRIC ELEMENTS; CHEMISTRY; CINEMATOGRAPHY; COMPOSITIONS BASED THEREON; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR; ELECTRICITY; ELECTROGRAPHY; HOLOGRAPHY; MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVINGCARBON-TO-CARBON UNSATURATED BONDS; MATERIALS THEREFOR; METALLURGY; ORGANIC MACROMOLECULAR COMPOUNDS; ORIGINALS THEREFOR; PHOTOGRAPHY; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES; PHYSICS; SEMICONDUCTOR DEVICES; THEIR PREPARATION OR CHEMICAL WORKING-UP

Photosensitive polymers containing repeat units with a 2,2,4,4,4-pentafluoro-1,3,3-trihydroxybutyl group or a 3,3-difluoro-4-hydroxy-4-trifluoromethyloxetan-1-yl group. Photosensitive polymers (I) with an average mol. wt. of 3000-100000 containing repeat units with a group of formula (R1) or (R2). Independent claims are also included for (1) photosensitive polymers (IA) with units (a) as above and units (b) derived from (meth)acrylate, maleic anhydride, norbornene, styrene, tetrafluoroethylene and/or sulfur dioxide; and (2) resist preparations containing polymers as above and photo-acid generators (PAG) Bereitgestellt wird ein Fluor enthaltendes photoempfindliches Polymer, das eine Hydrat-Struktur aufweist, und eine Resist-Zubereitung, die das photoempfindliche Polymer einschließt. Das photoempfindliche Polymer hat ein mittleres Molekulargewicht von etwa 3000 bis 100000 mit einer wiederkehrenden Einheit, die eine Gruppe einschließt, die eine der nachfolgenden Strukturformeln aufweist: DOLLAR F1