Drying substrates following immersion in treatment fluid, employs dipping carrier system which moves substrate between positions on carrier holder
The carrier (T) is moved relative to the treatment fluid surface (FO), bringing the carrier counter section (4) completely above the surface with the carrier (2, 3) immersed in the fluid. The substrate (S) is raised from the immersed carrier by means of a first lifter. The substrate, on a carrier ho...
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Main Authors | , |
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Format | Patent |
Language | English German |
Published |
30.10.2003
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Edition | 7 |
Subjects | |
Online Access | Get full text |
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Summary: | The carrier (T) is moved relative to the treatment fluid surface (FO), bringing the carrier counter section (4) completely above the surface with the carrier (2, 3) immersed in the fluid. The substrate (S) is raised from the immersed carrier by means of a first lifter. The substrate, on a carrier holder, is displaced into a second position. Further relative movement takes place between carrier and the surface of the treatment fluid, until the carrier is fully above the surface of the treatment fluid. The substrate is supported on the carrier over the fluid surface and is displaced in the holder on the carrier back into the first position. An Independent claim is included for corresponding equipment.
Die Erfindung betrifft eine Vorrichtung zum Trocknen von Substraten (S), wobei die Substrate (S) in einem in eine Behandlungsflüssigkeit eingetauchten Träger (T) aufgenommen sind, umfassend: eine erste Hubeinrichtung zum Heben des Trägers (T) aus der Behandlungsflüssigkeit, wobei die erste Hubeinrichtung einen Hubarm (20) zur Aufnahme des Trägers (T) aufweist, eine erste Hubeinrichtung zum Abheben der Substrate (S) von mindestens einem am Träger (T) vorgesehenen Trägerelement (2, 3). Zur Vereinfachung der Vorrichtung ist erfindungsgemäß vorgesehen, dass die erste Hubeinrichtung am Hubarm (20) angebracht ist. |
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Bibliography: | Application Number: DE2002115284 |