Ion-conductive membrane producing method, involves applying ion-conductive material on and/or in partial area of complete full-laminar porous substrate, where partial area is limited by dimensions of ion-conductive area of membrane

The method involves applying an ion-conductive material on and/or in a partial area (1.1) of a complete full-laminar porous substrate (1), where the partial area is limited by dimensions of an ion-conductive area (2.1) of an ion-conductive membrane (2). Pores are formed in a partial area of a comple...

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Bibliographic Details
Main Authors TOBER, HARALD, BERGER, KLAUS
Format Patent
LanguageEnglish
German
Published 12.05.2011
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Summary:The method involves applying an ion-conductive material on and/or in a partial area (1.1) of a complete full-laminar porous substrate (1), where the partial area is limited by dimensions of an ion-conductive area (2.1) of an ion-conductive membrane (2). Pores are formed in a partial area of a complete laminar pore-less substrate, and the ion-conductive material is applied in the partial area of the complete laminar pore-less substrate. A porous material insert is applied in a material recess, and the ion-conductive material is applied in the material insert.
Bibliography:Application Number: DE20101025814