Ion-conductive membrane producing method, involves applying ion-conductive material on and/or in partial area of complete full-laminar porous substrate, where partial area is limited by dimensions of ion-conductive area of membrane
The method involves applying an ion-conductive material on and/or in a partial area (1.1) of a complete full-laminar porous substrate (1), where the partial area is limited by dimensions of an ion-conductive area (2.1) of an ion-conductive membrane (2). Pores are formed in a partial area of a comple...
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Main Authors | , |
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Format | Patent |
Language | English German |
Published |
12.05.2011
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Subjects | |
Online Access | Get full text |
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Summary: | The method involves applying an ion-conductive material on and/or in a partial area (1.1) of a complete full-laminar porous substrate (1), where the partial area is limited by dimensions of an ion-conductive area (2.1) of an ion-conductive membrane (2). Pores are formed in a partial area of a complete laminar pore-less substrate, and the ion-conductive material is applied in the partial area of the complete laminar pore-less substrate. A porous material insert is applied in a material recess, and the ion-conductive material is applied in the material insert. |
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Bibliography: | Application Number: DE20101025814 |