Device for electron beam evaporation, comprises a crucible, by which a strip-shaped substrate to be coated is guided into a continuously operating vacuum coating system in a longitudinal direction, and a movable panel arrangement

• Main Authors: KAMMER, MANFRED, FUCHS, INGOLF, LAIMER, GEORG, DEUS, CARSTEN
• Format: Patent
• Language: English; German
• Published: 18.08.2011
• Subjects: CHEMICAL SURFACE TREATMENT; CHEMISTRY; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; COATING MATERIAL WITH METALLIC MATERIAL; COATING METALLIC MATERIAL; DIFFUSION TREATMENT OF METALLIC MATERIAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL; METALLURGY; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION

The device comprises a crucible (3), by which a strip-shaped substrate (1) to be coated is guided into a continuously operating vacuum coating system in a longitudinal direction (2), where a material is present as target (4) in the crucible and a layer is applied on a side of the substrate turned towards the crucible by using the material, and a movable panel arrangement, which is arranged between the crucible and the side of the substrate to be coated and changes the size of a coating zone exposed to the vapor synchronously to a change of the vapor cloud. The device comprises a crucible (3), by which a strip-shaped substrate (1) to be coated is guided into a continuously operating vacuum coating system in a longitudinal direction (2), where a material is present as target (4) in the crucible and a layer is applied on a side of the substrate turned towards the crucible by using the material, and a movable panel arrangement, which is arranged between the crucible and the side of the substrate to be coated and changes the size of a coating zone exposed to the vapor synchronously to a change of the vapor cloud. The crucible is moved back and forth transverse to the longitudinal direction. An arrangement of shape-variably adjustable shielding panel is provided between the substrate and the target or the crucible. The shielding panel consists of a parallel flat material lying to the substrate. The arrangement of shielding panel consists of a first shielding panel group lying on the substrate behind the coating zone in the longitudinal direction and a second shielding panel group lying above the coating zone in the longitudinal direction. Each of the shielding panel groups is provided with two movable panel parts, which are controllably formed, so that they cause a change of the coating of the substrate caused due to the movement of the crucible by the inclination of the vapor cloud and opposing the adjustment of the coating zone. The control of the moving panel parts is synchronized with the movement of the crucible. The shielding panel groups have immovable panel parts, which are arranged in an area over the center of the substrate. The movable panel parts are rotatably hinged to the immovable panel parts. The movable panel parts are formed as circular-segment-shaped disks, which are pivotable around an axis lying vertical to the substrate. The movable panel parts are connected with the mechanical drives for the pivotation. Der Erfindung, die eine Vorrichtung und ein Verfahren, bei dem in kontinuierlich arbeitenden Vakuumbeschichtungsanlagen ein zu beschichtendes Substrat, insbesondere als endloses Band in einer Längsrichtung über einen Tiegel geführt, in dem sich als Target das Material, aus dem auf der dem Tiegel zugewandten Seite des Substrates eine Schicht aufgebracht werden soll, befindet, wobei der Tiegel quer zur Längsrichtung hin und her bewegt wird, betrifft, liegt die Aufgabe zugrunde, die Schichthomogenität bei einer Beschichtung eines bewegten Substrates mittels Elektronenstrahlverdampfung unter Einsatz eines bewegten Tiegels zu verbessern. Dies wird dadurch gelöst, dass zwischen dem Tiegel und der zu beschichtenden Seite des Substrates eine dynamische Blendenanordnung angeordnet ist, die die Beschichtungszone synchron zu einer Veränderung der Dampfwolke verändert.