EUV-Strahlungsquelle mit hoher Strahlungsleistung auf Basis einer Gasentladung

The arrangement has electrode housing (1, 2), where the housing (1) is provided as a discharge chamber for gas discharge for plasma production. The housing (2) has a pre-ionization unit (7) to generate ionization of a gaseous stannous working medium. A gas supply unit (8) controls temperature and pr...

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Bibliographic Details
Main Authors GEIER, ALEXANDER, KLEINSCHMIDT, JUERGEN, RINGLING, JENS
Format Patent
LanguageGerman
Published 05.03.2009
Subjects
ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
X-RAY TECHNIQUE
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Summary:The arrangement has electrode housing (1, 2), where the housing (1) is provided as a discharge chamber for gas discharge for plasma production. The housing (2) has a pre-ionization unit (7) to generate ionization of a gaseous stannous working medium. A gas supply unit (8) controls temperature and pressure of the medium and has a gas inlet in a vacuum chamber (4). A thermo container (83) and a thermally isolated supply line (81) are provided to transfer the medium from the supply unit to the ionization unit. The line is connected with the housing (1) by the inlet.
Bibliography:Application Number: DE20051041567