Verfahren zum Herstellen einer Hartmaske in einem Kondensatorbauelement und eine Hartmaske zur Verwendung in einem Kondensatorbauelement
A method for producing a hard mask and a hard mask for use in a capacitor device comprises the steps of applying a photosensitive sol-gel layer to the capacitor device, applying a pattern to the sol-gel layer to form a patterned layer and applying a thermal decomposition treatment to the patterned l...
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Main Author | |
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Format | Patent |
Language | German |
Published |
29.11.2007
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Subjects | |
Online Access | Get full text |
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Summary: | A method for producing a hard mask and a hard mask for use in a capacitor device comprises the steps of applying a photosensitive sol-gel layer to the capacitor device, applying a pattern to the sol-gel layer to form a patterned layer and applying a thermal decomposition treatment to the patterned layer to convert it to a hard mask layer. |
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Bibliography: | Application Number: DE20041059034 |