一种真空磁控溅射薄膜镀制设备

• Format: Patent
• Language: Chinese
• Published: 29.08.2025
• Subjects: CHEMICAL SURFACE TREATMENT; CHEMISTRY; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; COATING MATERIAL WITH METALLIC MATERIAL; COATING METALLIC MATERIAL; DIFFUSION TREATMENT OF METALLIC MATERIAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL; METALLURGY; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION

本实用新型公开了一种真空磁控溅射薄膜镀制设备，涉及薄膜镀制技术领域。本实用新型包括箱体，所述箱体的正面转动连接有箱门，所述箱体的右侧开设有抽气孔，所述箱体的右侧固定连接有抽气管，所述抽气管与抽气孔呈连通设置，所述箱体的顶部固定连接有电机。本实用新型通过设置齿盘，具体是随着转轴转动，带动齿盘转动，随着齿盘转动，与齿盘啮合连接的齿轮发生转动，齿轮通过连接轴带动框架转动，从而带动物品在箱体的内部围绕转轴转动的同时自转，行星运动能够确保被镀膜物品在镀膜过程中受到来自各个方向的均匀轰击，而被镀膜物品的行星运动则能使其表面各个部分都能均匀地接受到溅射粒子的轰击，进而提升物品镀膜的成品质量。