High-uniformity chemical vapor deposition silicon carbide coating carrier plate

• Main Author: ZOU JIDONG
• Format: Patent
• Language: Chinese; English
• Published: 24.05.2024
• Subjects: CHEMICAL SURFACE TREATMENT; CHEMISTRY; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; COATING MATERIAL WITH METALLIC MATERIAL; COATING METALLIC MATERIAL; DIFFUSION TREATMENT OF METALLIC MATERIAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL; METALLURGY; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION

The utility model relates to the technical field of semiconductor processing, in particular to a high-uniformity chemical vapor deposition silicon carbide coating carrier plate which comprises a carrier plate body with a silicon carbide coating, a threaded sleeve is in threaded connection with the outer wall of the bottom of the carrier plate body, a clamping arc is fixedly connected with the outer wall of the bottom of the threaded sleeve, and four supporting mechanisms are arranged on the outer wall of the bottom of the clamping arc. The supporting mechanism comprises supporting legs, sleeves are fixedly connected to the outer walls of the tops of the supporting legs, sliding columns are slidably connected to the inner walls of the sleeves, and clamping blocks are fixedly connected to the outer walls of the tops of the sliding columns. Compared with the prior art, the loading disc overcomes the defects in the prior art, the four supporting mechanisms are arranged on the loading disc body, the adjusting boxe