Chassis of polycrystalline silicon reduction furnace and polycrystalline silicon reduction furnace

• Main Authors: FENG LIUJIAN, HE LONG, TEOKOORI, MUKUNDAS, YIN BO, WANG WEN, FAN XIECHENG, LIU XINGPING
• Format: Patent
• Language: Chinese; English
• Published: 24.05.2024
• Subjects: CHEMISTRY; COMPOUNDS THEREOF; INORGANIC CHEMISTRY; METALLURGY; NON-METALLIC ELEMENTS

The utility model provides a polycrystalline silicon reduction furnace base plate, a plurality of electrode holes are arranged on the plate surface of the base plate and used for being connected with silicon rods, the layout mode of the electrode holes is that the electrode holes are sequentially arranged on a plurality of electrode ring belts which take the center of the plate surface as the centroid from inside to outside, the number of the electrode holes on each electrode ring belt is 6n, wherein n is an arrangement sequence number of each electrode ring belt from inside to outside. The polycrystalline silicon reduction furnace chassis disclosed by the utility model is reasonable in structural layout, can effectively balance a thermal field, reduce energy consumption, improve quality and promote the improvement of the technical level of the polycrystalline silicon industry, and also provides a polycrystalline silicon reduction furnace. 本实用新型提供一种多晶硅还原炉底盘，所述底盘的盘面上开设有多个电极孔，用于连接硅棒，所述电极孔的布局方式是，从内至外依次布置在以盘面中心为形